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ref: -2011 tags: ttianium micromachining chlorine argon plasma etch oxide nitride penetrating probes Kevin Otto date: 03-18-2019 22:57 gmt revision:1 [0] [head]

PMID-21360044 Robust penetrating microelectrodes for neural interfaces realized by titanium micromachining

  • Patrick T. McCarthyKevin J. OttoMasaru P. Rao
  • Used Cl / Ar plasma to deep etch titanium film, 0.001 / 25um thick. Fine Metals Corp Ashland VA.
  • Discuss various insulation (oxide /nitride) failure modes, lithography issues.