{1456} revision 1 modified: 03-18-2019 22:57 gmt

PMID-21360044 Robust penetrating microelectrodes for neural interfaces realized by titanium micromachining

  • Patrick T. McCarthyKevin J. OttoMasaru P. Rao
  • Used Cl / Ar plasma to deep etch titanium film, 0.001 / 25um thick. Fine Metals Corp Ashland VA.
  • Discuss various insulation (oxide /nitride) failure modes, lithography issues.